Used CANON FPA 6000 ES6a #9296967 for sale

CANON FPA 6000 ES6a is a high-precision wafer stepper designed for lithographic and photomask pattern generation for semiconductor device processes. The stepper is capable of imaging intricate high-density features as small as 0.11µm with resolutions up to 2,040 pixels/inch (80,000 pixels/cm2) on five-inch (127mm) and eight-inch (203mm) diameter wafers. It is also capable of generating the smallest device feature sizes of 0.07µm for advanced very large scale integrated (VLSI) devices. The stepper is constructed of high-grade materials designed for maximum precision and reliability. CANON FPA 6000ES6A features a fully automated alignment equipment to ensure accurate wafer positioning and distortion control to maintain full field flatness when imaging larger wafer fields. With the laser interferometer feature, the stepper accurately measures the position of all critical components to ensure imaging accuracy. Additionally, the machine's advanced imaging system operates at variable speed with submicron-level accuracy and is capable of imaging the most challenging features such as narrow lines or dense patterns. The machine is equipped with a high-resolution, low-temperature-emission, extended-long-wavelength (ELW) optical unit that is capable of providing uniform illumination across the entire 5-inch and 8-inch diameter wafer. Additionally, the stepper has an anti-reflection coating designed to prevent any unwanted effects on the image due to light interference, while still providing excellent imaging contrast. For dynamic imaging, the stepper relies on three-dimensional (3D) scanning technology that is capable of providing up to 1,000 times higher fidelity and resolution for improved imaging quality. The operating environment also features an optimized temperature and humidity range for improved imaging capability as well as a vibration isolation machine that is designed to keep the machine stable during operation. FPA-6000ES6A has an adjustable stage for providing maskless lithography and optical proximity correction operations with superior imaging quality. In addition, the stepper uses up to five illumination modes for providing the most suitable imaging profiles for various lithography applications. Furthermore, the machine is designed to connect to a host computer through an Ethernet connection for basic operations and a dedicated control panel interface for advanced settings.