Used CANON FPA 6000 #293587902 for sale

CANON FPA 6000 is an advanced wafer stepper device with a high-resolution optical lithography equipment. This device is designed for semiconductor fabrication, and it is capable of producing high-accuracy patterns on a variety of wafer substrates. FPA 6000 provides a targeted light beam output of either 193 or 248nm wavelength and variable laser power up to 16W. This allows it to be used on a wide range of lithography projects and to create a variety of patterns with a spectrally-corrected lens system. The device is equipped with the latest digital image processing technology that enhances the accuracy of lithography, and it can accurately and precisely reproduce the smallest known images onto a variety of surfaces, including semiconductor wafers. The integrated image processing provides optimization and accurate placement of the smallest pattern features, such as line and space, contact, via holes and more. CANON FPA 6000 is equipped with a two-step auto-alignment unit that allows it to accurately maintain the desired wafer position for each exposure. In addition, FPA 6000 can also be used for co-axial lithography and features a variety of advanced features such as 1X and 7X magnification variations, auto-zoom and auto-shift. The device is also capable of performing a variety of exposure techniques and pulses, including multi-pulsing and double exposure, which can be used to effectively and accurately control pattern shapes, sizes and depths. The device also features a highly reliable and sophisticated microscope, as well as a three-dimension alignment scanner. This helps to ensure that the patterns on a wafer are aligned with a maximum accuracy of 0.5 microns, with a repeatability rate of less than 3 microns in wafer positioning. CANON FPA 6000 can also be used for spin coating, developing, and post-processing. This includes electroplating, chemical etching, and wet or dry patterning of various materials. Overall, FPA 6000 is a highly accurate, reliable and sophisticated wafer stepper device that provides optimised and precise results. Its advanced features, highly accurate imaging machine, auto-alignment capability, and multiple exposure settings make it versatile and convenient for a range of projects.