Used CANON FPA 6300 #9389983 for sale

CANON FPA 6300 wafer stepper is a highly advanced lithography tool used in the semiconductor manufacturing industry. Its precision and performance make it an attractive option for a variety of applications. It can be used for advanced patterning, resist exposure, and etching processes. FPA 6300 has several features which make it both efficient and accurate. It has a motorized zoom lens and a step-and-repeat equipment with a maximum field size of 25 mm by 25 mm. This allows for high accuracy when patterning wafers with intricate geometric shapes. It comes equipped with an auto-alignment system which automatically readjusts the focus for optimum accuracy. The stepper also has an advanced pattern recognition unit which can detect even the smallest geometrical errors. This ensures the highest fidelity in lithography. CANON FPA 6300 utilizes a double pulse-width modulation machine which reduces thermal effects. This helps to reduce the effects of radiation on the wafer, which in turn, increases the fidelity of the pattern. The stepper also has a linear stage with a maximum acceleration of 10 m/s2, providing fast and smooth motion across the wafer. It also has a high speed scan time of 12 msec, resulting in short scan times and high throughput. FPA 6300 also has an independent laser focus tool that reduces the amount of alignment setup and time required. This results in high focus accuracy and reliability, ensuring consistent high-quality results. It also has automatic gain control, which ensures optimum overexposure of the resist, as well as a built-in image stabilizer to minimize flickery effects. CANON FPA 6300 is a reliable and efficient stepper which offers high accuracy and speed. Its advanced features provide a competitive edge to semiconductor manufacturers, allowing them to achieve higher yields in a shorter amount of time. This ultimately results in lower costs and improved product quality, increasing customer satisfaction and brand loyalty.