Used ELECTROMASK / TRE 10X #9041056 for sale

ELECTROMASK / TRE 10X is a wafer stepper designed to produce high resolution digital images for semiconductor device fabrication. This type of lithography equipment works by using a light source to project an image onto a wafer loaded with photoresist. The light source is typically composed of a laser or light emitting diode (LED). The mask that holds the image information is placed in a holder and aligned with the wafer stage. When the image is projected onto the wafer it is exposed to the photoresist. The photoresist is then developed and the image is transferred to the wafer. TRE 10X is based on an advanced design with a movement resolution of 0.28 μm (micrometers) for both X and Y axes. The wafer stage is driven by linear motors and it has a maximum load capacity of 250 mm. The system is designed to operate at a maximum frequency of 120kHz, enabling fast processing of the photomasks, while assuring high accuracy of the printed patterns. This unit offers excellent repeatability and accuracy in the transfer of images to the wafer. ELECTROMASK 10X is equipped with an innovative optical alignment machine (OAS) for precise alignment of the mask or reticle with the wafer. This tool uses an optical sensor that captures images of the wafer and the mask and then reconstructs them in a computer. This sensor is also designed to detect any scraping or scratching on the mask or wafer before exposure to minimize the risks within the lithography process. In addition, 10X is also designed with different printing modes such as single exposure, overlap exposures, and shadow exposure. By having a wide array of exposure patterns, this wafer stepper is able to provide users with the ability to customize their pattern designs in order to meet different specific requirements. The asset also offers a multi-zone exposure head, designed to accommodate large chip sizes and an extended field of view. ELECTROMASK / TRE 10X is also equipped with intuitive user interface. The monitor display is integrated with various control functions including pattern correction, checking the existence of images, measuring and monitoring again, inputting magnification data, analyzing images among other functions. This model also allows users to select appropriate wafer sizes, bed types, mask patterns and exposure parameters depending on the specific lithography process that needs to be done. This wafer stepper is well suited for people who are developing microprocessors, integrated circuits and other semiconductor devices. Its high resolution and accuracy make it the perfect choice for fabricating high end semiconductor devices. In addition, its efficient and intuitive user interface allows users to complete their pattern designs with minimal effort.