Used ELECTROMASK / TRE 5X #9041055 for sale

ELECTROMASK / TRE 5X is a state-of-the-art wafer stepper designed by the Japanese company Nikon for photolithography or the transfer of patterns onto a resist layer on a wafer. This equipment includes a main lens, a reticle stage, and a projection optic which is capable of transferring patterns with a minimum size of 1.4 microns onto a 200 mm wafer. The first step of photolithography is the alignment of the reticle stage which is done with a TRE 5X optical magnification microscope. Once the reticle is in position the main lens can be focused on the wafer being processed. The main lens used in the system consists of four lenses, two of them with a high numerical aperture of 0.46 and two achromats that correct abberation at larger apertures. The resolution limits of the unit are 0.25 microns on a wafer with a 5% uniformity of illumination. The projection optic in the machine which reads the data from the reticle is a quadruple 4X optical magnification microscope with a numerical aperture of 0.25 and a pattern transfer spot size of 0.5 microns. The alignment of the projection optics is carried out with the use of a telecentric alignment which automatically compensates the magnification error. A signal from the reticle is picked up by a sensor and used to adjust and monitor the telecentric alignment. The wafer stage of the tool is capable of achieving sub-micron accuracy due to its position detection asset which utilizes a CCD camera and a precision beam splitter. By combining this model with a focal plane the position of the wafer is accurately measured while also providing a high precision stage operation. ELECTROMASK 5X is also equipped with protection modules and feedback control systems to ensure the equipment's safety and accuracy. This system also includes an auto-loading unit which allows for efficient and complete wafer processing. The machine is also capable of processing multiple wafer types at once. Overall, 5X is a highly advanced and sophisticated wafer stepper which provides a high level of precision and accuracy in the photolithography process. The tool is ideal for use in fields such as integrated circuit fabrication, medical engineering, and data storage.