Used GCA 1696 #9214877 for sale

GCA 1696 is a wafer stepper designed by GCA Corporation. It is a highly advanced photolithographic exposure equipment with remarkable precision and speed. This tool is able to create exact images of microscopic structures on the wafer surface in a single exposure. The robust nature of the system allows users to make precise exposures with low exposure times. The wafer stepper has a special light source which provides the photolithographic exposure. This light source is adjustable to provide different levels of light intensity for the exposure time specified by the user. The optical unit of the stepper is designed to provide high resolution images on the wafer surface. The stepper has a unique focus mechanism which keeps the optics accurately focused - even over multiple exposures. This ensures that the wafer is exposed with the highest possible accuracy and repeatability. The wafer is placed in the automatic chuck and all movement is optimized through a sophisticated onboard controller. The controller precisely coordinates the movements of the various axes of motion to achieve the desired results. The stepper has a special feature, called 'connect and expose', which enables users to quickly and easily reset the exposure time with minimal exposure errors. The stepper is also equipped with special software designed to optimize the exposure process. This software is capable of adjusting the exposure time and temperature for different types of materials. It can also handle distortions, accommodates multiple substrates, and maintains a uniform pattern of exposures. The software is also capable of measuring the spot size accurately and can be programmed to generate specific patterns. The entire machine is designed to be extremely efficient and reliable. The innovative design is capable of providing repeatable results, even over long exposure times. The tool is also designed to be extremely energy efficient, with minimal power consumption. 1696 is an advanced and powerful tool for photolithographic exposure. It is capable of creating precise images of tiny structures on the wafer surface with high speed and accuracy. This wafer stepper is ideal for high volume production of semiconductor wafers as well as imprint lithography applications for device fabrication and metrology. It is a reliable and efficient tool for advanced photolithographic production and research.