Used GCA 6300 #131412 for sale

GCA 6300
Manufacturer
GCA
Model
6300
ID: 131412
Stepper.
GCA 6300 is a state-of-the-art wafer stepper equipment manufactured by GCA Corporation. It is a high speed, high accuracy lithography tool utilizing the latest projection imaging technology. It is capable of transferring circuit patterns defined by photomask onto the surface of substrate materials such as semiconductor wafer, optoelectronic materials, and flat panel displays. 6300 is a unique wafer stepper system due to its ultra-high resolution which is determined by the numerical aperture (NA) of the condenser lenses. This allows for up to 0.5 μm pattern element size to be produced. It is also designed to minimize distortion, allowing for sub-micron variations of pattern size and alignment during the imaging process. This precision is attained with GCA 6300's scanning stage, which utilizes high resolution linear encoders coupled to control the stage's motion. The unit has an impressive maximum throughput rate of 31 wafers/hour with an average size of 6". Furthermore, 6300 features an advanced scanner subsystem which can handle up to two photographic slides or photomask film at the same time. This allows the operator to rapidly switch between different patterns, even on the same wafer. GCA 6300 is also fully automated, which significantly simplifies user operation. Setup, imaging, alignment, focus control and machine monitoring can all be done via computer-controlled precision micro- motors. This tool provides ample flexibility and efficiency to lithography operations. In terms of safety and maintenance, 6300 has an array of features to ensure safety at all times. Its integrated safety interlocks minimize the risk of cross contamination, while a three stage cranking mechanism prevents the asset from fatigue due to frequent motion. Additionally, a vacuum degas chamber is incorporated for enhanced image resolution. Overall, GCA 6300 wafer stepper is an high performance imaging tool capable of superior results for a broad range of substrates. It offers ultra-high resolution, superior throughput, and automated operation.
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