Used GCA 6300B #9186800 for sale

GCA 6300B is a wafer stepper designed by GCA, a type of semiconductor lithography equipment used for processing integrated circuit (ICs) wafers during the fabrication of ICs. It can image patterns onto wafer surfaces using either one or two beam sources. The machine is capable of supporting wafers up to 200mm in diameter and can process up to sixteen wafers at once. 6300B is equipped with a Germanium (Ge) excimer laser which produces two 193nm wavelength beams that can be focused onto the same spot. It is capable of producing a resolution of 0.50 microns which is highly accurate for a range of lithography applications. The laser can also be configured in either pulse modulation mode, for single beam applications, or double-pulse mode for dualbeam applications. The stepper is designed with a heavy-duty stress-balanced long-axis/short axis gantry subsystem, which enables accurate alignment of the wafer under variable conditions. The stepper utilizes high-precision air bearings for controlling the long axis motions, allowing it to remain stable during vibration or temperature fluctuations. It is also equipped with an advanced imaging focal depth control system, which ensures that the laser beams remain perfectly parallel to the wafer's surface. GCA 6300B offers a wide range of exposure field sizes, ranging from 1mm x 1mm up to 480mm x 480mm, allowing it to process large-area wafers and micro-scale patterns. It also offers a unique feature called "variable-slope exposures", which allows the laser to vary the exposure length or "burn time" at different sites on the wafer for processing highly complex designs. 6300B is a reliable and highly accurate wafer stepper, offering cutting edge functionality for processing small and large areas of the wafer. Its advanced lithography capabilities, combined with its stable and durable design, make it an excellent choice for intricate wafer processing projects.