Used GCA 6300C #9181535 for sale

GCA 6300C is a wafer stepper, a type of lithography tool used in semiconductor fabrication. It is a high precision device commonly used to transfer a pattern from a mask onto a wafer or substrate. 6300C is capable of step-and-repeat photolithography in 6", 8", and 12" wafer sizes. The lens equipment of GCA 6300C is powered by a Thorium-Fluoride design that allows for outstanding resolution and repeatable performance. The lens system is operated by a closed-loop CCD camera located on the turret. This allows for high magnifications and active alignment capabilities. The CCD camera is also used to detect any alignment errors and optimize the position of the operator's wafer. The stepper is connected to a computer unit which allows the user to program the machine with the desired settings. The user can enter the desired magnification, focus, substrate temperature, and shutter speed. The tool also includes a wave-front sensor which measures the aberration of a lens asset for optimum quality of the transfer image. 6300C is an excellent option for high-resolution, high-speed lithography applications. It has a maximum throughput of 1 20,000 wafers a day, and can handle wafers up to 12" in diameter. The model operates at a wavelength of 248nm and can achieve pattern resolutions up to 0.3 microns. The equipment can also achieve feature-sizes up to 0.2 microns, with excellent line-edge roughness. GCA 6300C is also designed for low-maintenance operation. The design elements are designed to increase up-time and reduce the time to complete a full-loop alignment. The stepper is also compatible with standard accessories such as focus motions, reticle changers, and load/unload systems. It is also capable of convection assisted etch processes and is designed for stringent cleanroom requirements. 6300C is an excellent option for anyone needing superior resolution, speed, repeatability and low-maintenance in a lithography system.