Used GCA 6800 #182892 for sale
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ID: 182892
G-line Stepper
Manual load of reticle
Paddle wafer loader
6" x 6" X/Y stage motions
Stage controlled motions with data input of 0.1μ in metric mode
Stage precision of +/- 0.15μ
Stage orthogonality ( software correctable) of +/- 0.5 arc sec
Die rotation of +/- 0.2μ over 11mm
Lens reduction of +/- 0.2μ over 11 mm
Trapezoidal error of +/- 0.2μ over 11mm
System is fitted with a Tropel 2035 5X g-line (436) lens with a .35NA and a 20mm dia. field.
Lens spec. for this lens is 1.0 microns on ultra-flat wafers, but can be pushed lower
Mercury light source will have a Maximus 1000 power supply and illuminator corrected for 436 nm (g-line)
Auto focus in Z axis
All electronic cards will be upgraded to latest available revisions
Reticle loading will be manual type and will use a 5x5 inch reticle
Wafer Handling will be done using a paddle system with paddles for 100 mm dia. wafers and pieces
Wafer alignment (global) will be upgraded to a CCD camera
Global objective spacing will be set for 76.2 mm separation
Global Alignment system Registration of +/- 0.35μm
The system uses a DEC PDP-11 computer
An environmental water cooled chamber to be supplied with the uni
Chamber power will be set for 208 volts, 60 Hz, 3 phase 30 amps, and the Electronic rack is 110volts, 60Hz, 30 amps.
GCA 6800 is a wafer stepper that is capable of producing high-quality microlithography images. This is an advanced tool for producing semiconductor integrated circuit devices, providing large-scale imaging with small feature sizes. 6800 is based on the same principles as other stepper scanners, but its design incorporates many improvements. GCA 6800 house four independent laser emitters with three electric mirrors that control their beam splitting for mature performances. Its auto-focus system is designed to ensure accurate imaging and fast scanning cycles. The stepper is capable of producing fine widths of 100 nm and below, with a maximum pattern size of 400x400 mm . The wafer stage is capable of moving along two directions, with 8 isolated drive and motion control systems. The stepper is also equipped with dual full field cameras that enable tracking and imaging through its 'adaptive feedback optics'. This stepper also incorporates a variety of safety features that provide high reliability and optimum protection against mis-processing. These features include, among others, an X-ray interlock which prevents access to laser radiation and an accurate laser locking system that avoids unauthorized operation. Furthermore, 6800 is equipped with dedicated software to simplify operation instructions, allowing the user to set parameters and receive process completion reports. GCA 6800 is a powerful tool for chip production that offers high resolution, accurate imaging and fast scanning. This wafer stepper is ideal for the manufacture of semiconductor devices and is robust and highly reliable for safe and consistent operation.
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