Used GCA 8000 #131413 for sale

A GCA 8000 Wafer Stepper is an optical lithography machine used in the fabrication of microcircuitry components. It is a leading-edge tool for micropatterning and integrated circuit Photolithography. This tool is used in the manufacturing of ultra-precise patterns on semiconductor wafers. The features of 8000 include: an automated reticle changing system, a 0.6 µm alignment accuracy, a 7.5 nm resolution, and an auto-leveling wafer stage. Furthermore, it has a maximum pattern size of 100mm x 200mm and supports quartz, glass, and silicon substrates. The operation of GCA 8000 starts with the device loading a reticle in the stepper. The reticle is then aligned with a reference point. The device then uses a series of miniaturized lenses to project the image of the entire reticle onto the wafer. The mini lenses can be adjusted to change the focus or magnification of the projection. After the photolithographic exposure the wafer is fed into the developing system. This is a wet-chemical process that results in the removal of photoresist exposed to the light. The developing system includes tanks with a variety of solutions, used to clean and remove the photoresist. 8000 is quite an impressive piece of technology, and its applications are numerous. It is a highly reliable, advanced tool that is used in a wide range of production lines. It is capable of producing accurate, high-resolution patterns on substrates with minimal defects. This technology can be utilized for precision fabrication of various types of integrated circuitry.