Used GCA ALS I2235 #9247980 for sale

Name: GCA ALS I2235
Brand: GCA
SKU: 9247980
Availability: InStock

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Wafer Steppers

Manufacturer

GCA

Model

ALS I2235

ID: 9247980

Stepper Lens: TROPEL 2235 i-Line (365 nm): 0.35 NA Field size: 22 mm Automatic Wafer Handler (AWH): Cycle 25, 3"-8" Automatic level wafers RMS10: (10) Reticles, 5" Maxi 2000: i-Line light source idles: 1000 W AFS 100: Automatic Focusing System MicroDFAS: Measures local alignment system Corrects alignment prior to stepping SmartSet: Used to process and store data to match single / multiple steppers Insitu probe: Probe mounted stage and lens reduction Rotation & focus with alignment baseline IQ Probe: Lamp position and light source Accurate measure and correct dose Programmable Platen Control (PPC): Automatically adjust reticle load position Integrated Alignment System (IAS): Performs digital alignment of global target Environmental chamber 8860 Stepper With temperature & cleanliness Options: System resolution: 0.7 µm line / space Depth of focus: 1.5 µm Illumination uniformity: ±2.5 % Illumination intensity: >300 mW / cm² Open frame: No repeaters Reduction: ±0.1 µm Rotation: ≤0.05 µm Telecintricity: ≤1.5 ppm / µm Stepping repeatability: ≤0.15 µm Global alignment: ±0.3 µm Local alignment: ±0.2 µm RMS reliability: 100 Cycles Reticle blade accuracy: ±0.25 mm AWH Reliability: 100 Wafers AWH Accuracy: ±0.003” Leveling repeatability: ±5 ppm from nominal.

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GCA ALS I2235 is a microlithography wafer stepper used for semiconductor fabrication and related scientific purposes. It is manufactured by GCA Corporation and delivers high-accuracy, high-throughput, high-volume production. ALS I2235 includes a five-axis mechanism that enables full field alignment while accommodating various chip sizes, shapes, and levels of complexity. This allows for quick alignment changes and product configuration adaptability. It is also equipped with an automatic aligner to reduce manual process times for precise component level alignment. The central component of GCA ALS I2235, the GSX750 Exposure tool, provides a 2500W Xenon-arc lamp for superior exposure temperatures and a proprietary precision optics control system for unparalleled accuracy. The optical control system not only provides crystal-clear imaging, but it also provides a seamless overlay alignment process for multi-level photolithography. ALS I2235 is built on a solid-body frame to minimize vibration while providing a wide range of chip-loading and intra-batch alignment features to maintain accuracy and scalability from batch-to-batch. It also offers a wide range of high-end productivity features, such as wafer-level and pattern-level alignment together with real-time focus detection and full-field alignment. GCA ALS I2235 features a highly efficient workflow, from wafer to wafer alignment and advanced automation features, such as programmable chip geometry capabilities and multiple edge-detection options. These features allow finer control over the microlithography process with high accuracy, repeatability, and minimized manual workflow. Furthermore, ALS I2235 utilizes a touchscreen operation and an intuitive graphical user interface for user-friendly operation. In all, GCA ALS I2235 is an ideal wafer stepper for process control in advanced e-beam and photolithography production and is well-suited for high-accuracy, fast, high-volume production. Its various features, including versed automation and ultra-high-resolution optics, provide a platform for specialized and controlled semiconductor fabrication.