Used GCA ALS #293639853 for sale

Name: GCA ALS
Brand: GCA
SKU: 293639853
Availability: InStock

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Wafer Steppers

Manufacturer

GCA

Model

ALS

ID: 293639853

I-Line wafer stepper Illumination uniformity: <= 2.5% Maximum stage travel: 200 mm System resolution: 0.65 μm L/S Depth of focus: >= 0.98 μm Reduction: +/- 0.10 µm Rotation: <= 0.05 µm Telecentricity: +/- 0.5 ppm Global registration: +/- 0.30 µm T.I.R Local registration: +/- 0.15 µm T.I.R Open frame: No repeaters Orthogonality: +/- 1.0 ppm Stage precision: +/- 0.15 µm Wafer levelling repeatability: +/- 10 ppm Reticle aligner accuracy: <= 0.1 µm Aperture blade repeatability: +/- 0.25 mm Aperture blade skew: +/- 0.25 mm RMS Realiability: 30 Cycles AWH Precision: +/- 3.0 mils AWH Reliability: 50 wafers Focus repeatability: <= 0.30 µm T.I.R Reduction repeatability: <= 6.0 ppm T.I.R Optic: Lens specification: 2145-I Tropel Focal length: 86 Resolution: 0.65 µm Image field: 24.1 mm Wavelength: 365 mm E.P Diameter: 49 mm E.P. Location: 473 mm Reduction: 1:5 Depth of focus: n+/- 0.5 µm.

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GCA ALS is a wafer stepper designed by GCA Corporation for advanced lithography applications. The stepper features a computer-controlled wafer stage, which travels in X, Y and Z directions with a repeatability of 0.1 micron. It has an ultra-high-rigidity base, which allows for the highest precision alignment and lithographic accuracy. This stepper is an advanced and efficient equipment, enabling fast and accurate microlithography, for the fabrication of nanoscale structures and devices. The advanced lens system allows for a wide range of features, such as a full field exposure of 0.6 micron to resist. The stepper also has a low-temperature/high-accuracy UV exposure unit with a maximum line speed of 30 mm/sec. The overall machine includes a light source, lens, shutter, measurement tool, image processing asset and exposure control. All of these components can be combined to achieve different objectives such as maximum exposure stability, resolution, and productivity. The wafer stepper also features advanced process control and software capabilities. It includes an integrated process management model that can control exposure parameters such as exposure time, laser power and mesh control. The mesh control feature provides improved process control by detecting and predicting small processing errors over a large surface area. This can help reduce or even eliminate defects from the lithographic process. In addition to the wafer stepper, ALS also features built-in process algorithms for alignment, exposure, and development. This ensures maximum repeatability for critical lithographic processes. It can also be integrated with inspection and storage systems for data handling and storage. In short, GCA ALS is a highly advanced wafer stepper designed to be cost effective and enabling high accuracy and high throughput lithographic processes. It is a powerful equipment that provides great flexibility and precision for nanostructure fabrication.