Used GCA ALS #35132 for sale

Manufacturer
GCA
Model
ALS
ID: 35132
Wafer Size: 6"
Stepper, G-line (Ziess 10-78-46), 5X reduction, .38NA, .9um resolution, configured for 6" wafers and can be changed to any size, running and ready for demo.
GCA ALS (Application Light Source) is a wafer stepper used for photolithography. It provides high precision optical imaging and pattern alignment for the production of semiconductor wafers and other related materials. ALS is equipped with an 8-channel LED system with up to 6,000nm illumination of original photomasks and up to 10,000nm imaging resolution. GCA ALS utilizes advanced optical transport system which ensures accurate alignment of light from the photomask to the wafer surface. This is done to ensure that the imaging results are accurate and free of errors. ALS is also equipped with a special laser energy source for the ablation of non-metal and non-oxide masking layers. Overall, GCA ALS is capable of a variety of patterning processes related to the production of semiconductor materials. With a ALS machine, advanced features such as high-resolution imaging and advanced mask alignment are achievable. The machine is also equipped with a multi-layer stack wafer handling system, giving the user a full range of dust and defect elimination options. For improved throughput and accuracy, GCA ALS is equipped with a true micro-stepper scanning mechanism which allows for precisely optimized actions within a single exposure field. Additionally, ALS is capable of real-time error detection and correction of both position and focused layers thanks to its embedded laser markings technology. GCA ALS also supports the introduction of process recipes for all phases of integrated circuit (IC) manufacture, making it possible for users to develop optimized processes for a wide range of applications. The machine is capable of the highest throughput and accuracy available with the latest optical imaging techniques. Overall, ALS is a sophisticated piece of equipment that offers precision imaging and scanning for the production of semiconductor materials. The integrated optical transport and laser source technologies ensure error-free results and the range of features available make it ideal for a wide range of applications.
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