Used GCA DSW 8500SE #9252320 for sale

Manufacturer
GCA
Model
DSW 8500SE
ID: 9252320
Stepper Lens: TROPEL 2142G (436 nm), DFAS, PPC, 5x Reduction Illumination: Theta III, insitu, maxi 2000 pulsed Lamp power: Rated 1050 W MIMIR 4105 Optical energy controller Includes: HVAC Unit (R12) GCA 6660S Environmental chamber Chiller Spare parts ~1992 vintage.
GCA DSW 8500SE is a step and repeat wafer stepper equipment that is suited for a variety of applications in semiconductor fabrication. The system is loaded with features such as broad spectral sensitivity, ultra high resolution, precise pattern placement, and fast throughput. The machine's sensitive, deep-UV optics and advanced optical imaging technology allow it to expose a broad range of photoresists to a wide range of wavelengths and a wide range of layer thicknesses. This is optimized for use with advanced lithographic processes. A precise stepper motor-driven x-y stage allows for precise pattern placement throughout the entire wafer. This makes it possible to align and register with sub-micron accuracy. DSW 8500SE's lithographic imaging precision is maintained across a variety of image intensities and scale ranges. The robust mechanical design of the machine allows the unit to work with extremely high accuracy, even when exposed to vibration from other machines. Its vacuum-enclosed stage ensures optimum wafer stability during the stepper's operation, increasing throughput and reliability. GCA DSW 8500SE provides fast throughput, with a wafer-load time of less than two minutes to obtain excellent film uniformity and Image placement stability. Its advanced imaging capabilities also allow for straightforward image scaling and highly advanced overlay tolerances. The machine's user-friendly features include a control panel for adjustable light intensity and easy-to-read display screens for quick adjustment of the exposure parameters. Additionally, the tool can be automated with optional automation capability. Overall, DSW 8500SE is an excellent choice of wafer stepper for semiconductor fabrication due to its broad spectral sensitivity, precision, speed, and user-friendly features. With its reliable advanced optics and thermal performance, the asset is an ideal choice for customers that require a reliable and stable photolithography model.
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