Used GCA XLS 7800 #9246052 for sale

GCA XLS 7800 is a full-field optical imaging equipment that delivers the most advanced stepper technology available for wafer lithography applications. The stepper technology combines customizable, high-precision exposure optics with an innovative light field lens for improved depth of focus, allowing users to produce devices down to the 12µm level with air-bearing slides, 18µm with light field lenses installed, and 0.35µm minimum feature sizes. The system also integrates GCA proprietary iCentris™ imaging control unit, an integral component that enables process tweaking and high-resolution imaging. XLS 7800 is a proven production-class lithography machine that provides very high throughput and resolution. It features a full wafer field 40mm x 40mm, with a maximum wafer size of 200mm for full service wafer scanning and imaging. GCA XLS offers superior image accuracy and stability through its Skyfire™ optical imaging tool, a unique alignment and imaging controller. Skyfire calibration boards on each tool are used at start-up, shut-down, and throughout every shift to provide process stability and repeatability. GCA XLS 7800 offers UV-ASMLTM diamond-turned optics with up to 3.4x magnification. This advanced optics asset provides high resolution imaging and precise fine-tuning of exposure parameters to ensure best image quality. This is aided by high contrast and uniformity across the field, which are further enhanced by its dynamic particle monitor. XLS 7800 also employs a rapid-change reticle model which allows for greater throughput and reduced maintenance time. The tool also offers exceptional automation, with fully automated indexing, autofocus, mount recognition, and edge detection. Stepper setup is performed automatically through the included Auto-Setup option. Index and step repeat accuracy are effectively maintained by GCA zigzag eye patterning. GCA XLS 7800 also offers a broad spectrum of resist processes, simultaneously supports a variety of resists on the same wafer, and offers a single platform to support From Wafer To Reticle™ laser direct imaging. XLS 7800 is a highly reliable and cost-effective imaging equipment for a broad range of wafer lithography applications, offering a versatile, feature-rich solution for production and research and development needs. It provides maximum throughput, accuracy, and process yield with minimum maintenance, making it a perfect choice for any advanced lithography operation.