Used GCA XLS #111828 for sale

GCA XLS wafer stepper is a highly automated tool used in the semiconductor industry for wafer manufacturing processes. It is a DUV stepper that is commonly used for various lithography processes, such as lithography for optical and electronic circuit formation on integrated circuits and MEMS components. XLS Wafer Stepper is a multi-beam projection exposure tool with a projecting image size of up to 6x6 inches. It has advanced optics design and proprietary software that allows it to achieve a high degree of throughput and accuracy. The multi-beam exposure tool provides an efficient, high-quality optical imaging process with improved light control. GCA XLS Wafer Stepper can handle a variety of mask frames (up to 8"x8") and wafers of all sizes, ranging from 3"- 8". The stepper has an advanced non-contact stage equipment with a 1.5um accuracy and an exposure unit capable of exposure speeds of up to 200Kms (20000 seconds). It also provides a unique mask alignment system with a 4nm accuracy. The powerful motor allows it to achieve a resolution of 4nm for both the X- and Y-axes, and 8nm for the theta-axis. In addition, XLS Wafer Stepper has a built-in air cleaning unit with a continuous air machine and a two-stage filtration tool. The stepper also features a strobe asset and an enhanced strobe so that it can work with special image overlays, such as polarized light and topographer functions. The automated level alignment model allows the stepper to accurately measure the tilt of the wafer and ensure the highest quality exposure. GCA XLS Wafer Stepper can process both compound and binary mask layers. It can also process wafer alignment equipment using a dedicated lookup table with built-in high-accuracy registration capability and a pixel-level editor that enables high-precision editing of the alignment data and mask patterns. Overall, XLS Wafer Stepper is a cutting-edge technology that provides a powerful and accurate solution for manufacturing semiconductor products. Its advanced technology and proprietary software enable it to provide a high degree of throughput and accuracy, making it a highly effective tool for semiconductor production.