Used ICOS T 102 #9154670 for sale

ICOS T 102 is a wafer stepper from ICOS Vision Systems Corporation that is specifically designed for advanced semiconductor lithography applications. It is equipped with a number of features that make it ideal for semiconductor production. The core of the machine consists of a high-extinction lamp, an optimized lens system, high-resolution digital servo motors and a rotating stage that has been designed to limit drift and improve repeatability. The machine also comes with several optional components such as interface cards, software and positioners that can be tailored to accommodate different semiconductor processes. T 102 features a two-beam system which helps improve scanning and imaging speed. The two beams are used to simultaneously expose different areas of the wafers, allowing for greater throughput. This system is also capable of offering high quality across the entire field of view. The design of the lenses also allows for a high degree of accuracy and resolution. ICOS T 102 utilizes a variety of positioners to ensure the wafer is precisely placed within the scanning field. The main components of the positioners are a Leveler, Stage Rotator and Wafer Gradient Tracker. The Leveler is responsible for accuracy and repeatability while the Stage Rotator is responsible for rapid switching between wafers. The Wafer Gradient Tracker is also used to verify the exact position of the wafer within the machine's field of view. T 102 is designed to work with high resolution imaging folders, allowing for high resolution imaging for advanced semiconductor processes. The machine is also equipped with an automatic wafer loading mechanism, enabling it to quickly and accurately align the wafer before the scanning process begins. The machine is compatible with a variety of wafers and is designed to process a wide range of materials used in semiconductor production. It is also equipped with many safety features to ensure reliable and safe operation. ICOS T 102 has been designed to provide high performance with minimal downtime, making it an ideal choice for semiconductor lithography applications.