Used KOMATSU G20K2-1 #9095924 for sale

KOMATSU G20K2-1 is a high performance wafer stepper, designed to accurately position and align photomasks with a high degree of accuracy for image-transfer processes. This robust, integrated wafer stepper utilizes a field programmable logic device (FPLD) and a multi-sample crosshair camera to accurately locate the photomask and create an accurate crosshair referenced to the sample area on the photomask. The FPLD, coupled with the motion and control unit, allows KOMATSU G 20 K 2-1 to accurately position the photomask. This unit measures the positioning of the wafer in the X and Y axes and generates continuous data for dynamic control. An environmental eyeglass beam sensor with advanced illumination quenching circuit captures data for precise measurement. G20K2-1 is equipped with two sets of micrometers to facilitate accurate micro-alignment of the photomask. The micrometers measure the distance between the photomask and the wafer every 0.1mm, and the data is sent to the control equipment and the wafer stepper to adjust the position and alignment of the photomask. Motor-driven motors are used to drive the micrometers. G 20 K 2-1 is also equipped with an auto-focus system and a laser alignment device. The auto-focus unit employs a CCD camera to capture data regarding the focal length of the photomask. This data can be used to adjust the distance between the photomask and the wafer to ensure accurate focus. The laser alignment device utilizes a beam sensor to analyze the crosshair image on the photomask from the edge of the wafer. This data is used to correct the positioning of the photomask before the exposure process begins. In order to further improve the accuracy of the position and alignment of the photomask, KOMATSU G20K2-1 utilizes an advanced analysis and correction algorithm that eliminates spot defects in the crosshair image. In addition, the FPLD can be programmed to accommodate different exposure parameters. KOMATSU G 20 K 2-1 is also equipped with an integrated diagnostics and monitoring machine. This tool monitors the performance of the machine and makes suggestions for improvement. Furthermore, all of the data and parameters from the FPLD and the motion and control unit can be transferred to a central station, allowing for remote control and monitoring of the entire asset. Overall, G20K2-1 is an advanced and robust wafer stepper designed to deliver outstanding performance and accuracy for image-transfer processes. With its advanced features and technologies, it ensures the most precise result for all photomask exposure.