Used NIKON 10897B #293665610 for sale

NIKON 10897B wafer stepper is a highly precise, large field imaging equipment that is designed to produce highly accurate images of large semiconductor wafers. This system uses a high-resolution stage that allows it to achieve an imaging accuracy as small as 1 nanometer in a field size of 450 mm. 10897B has a two-wavelength laser unit, combining a 405nm gallium-based ArF (argon fluoride) excimer laser with a 532nm frequency-tripled Nd: YAG (neodymium-doped yttrium aluminum garnet) laser. This two-wavelength machine allows it to image thinner layers than single-wavelength systems. NIKON 10897B has a low k1 distortion, which allows it to image with less distortion in the image plane. It also has a high numerical aperture (NA), which enables it to collect more light through the lens, allowing it to achieve high resolution. This tool has an anti-reflection coating on the lens, which helps it to avoid light scattering and reflection, thus improving image quality. 10897B wafer stepper is built with a 6-axis motion asset, which ensures accurate positioning when patterning wafers. It is integrated with NIKON S2M Optimizer software, which regularly monitors and compensates for discrepancies between machined features and design patterns, providing high throughput and accuracy. It also has an active vibration control model that isolates external vibrations to a permissible level, ensuring high accuracy. NIKON 10897B has a high-speed patterning rate of up to 360 patterns per hour, enabling rapid throughput rates for wafer steppers. It also has improved data flow operations, allowing the equipment to be connected to other equipment at speeds of up to 12 megabits per second and to load data files quickly. In addition, the system is designed to be easily maintained, with a compensating filter unit and cleaning functions for regularly cleaning the stepper. Overall, 10897B wafer stepper is a highly advanced and precise imaging machine built for semiconductor wafer processing. It offers a large imaging field, two-wavelength laser tool, low k1 distortion and high NA, anti-reflection coating on the lens, 6-axis motion asset and S2M Optimizer software, active vibration control model, high-speed patterning rate, and improved data flow operations. These features enable NIKON 10897B wafer stepper to provide high accuracy and throughput rates, ensuring efficient and high-quality wafer production.