Used NIKON FX-601F #9241806 for sale

NIKON FX-601F is a wafer stepper machine designed and developed by NIKON Corporation. It is mainly used in lithography systems for semiconductor process development and manufacturing. The machine is capable of collecting broad range of stepper patterns and is capable of processing wafer sizes up to 300 mm in diameter. It is suitable for a variety of photomask manufacturing areas and processes. NIKON FX 601F wafer stepper is equipped with a digital image processing equipment that processes an input image provided to the system. The unit applies lithography processes such as compression, crop, mask and cut, for exact pattern replication on the wafer. The input pattern is detected by a three-channel photoelectric sensor which is then converted into binary pattern data. The data is subjected to amplification, smoothing, filtering and finally goes to print onto the wafer. FX-601F wafer stepper offers precise and fast printing with its improved linear encoders and broadcast servo drive motors. The machine is capable of producing various patterns including line/space patterns, pulse electronic patterns, overlapping patterns and contact hole patterns. It features a wide machining area of 211 x 211 mm with 0.2μm address resolution. The accuracy and uniformity of the printed patterns depend on wafer surface flatness accuracy and step speed. FX 601F wafer stepper is equipped with a film protection machine to protect the masked patterns. This tool detects the breakage of the film due to external force, and stops the printing to avoid damage to the pattern. The machine is also equipped with a high-sensitivity auto focus asset to ensure the quality of the printed patterns. The machine has a built-in recipe data base which stores all the programs for wafer processing and photomask manufacturing. NIKON FX-601F wafer stepper is designed for easy operation and maintenance. It has a sophisticated Docking station which provides simplified wafer loading and unloading operations. The ergonomically designed user interface panel with graphical operation menu enables user to easily set up machine parameters for efficient operation. NIKON FX 601F wafer stepper is capable of processing various pattern shapes with high precision. It is an ideal machine for photomask manufacturing and semiconductor processing since it offers easy maintenance and production cost efficiency. With the help of this machine, high-yield photomask manufacturing can be accomplished.