Used NIKON FX 701 / FX 901 #293661855 for sale
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NIKON FX 701 and FX 901 wafer steppers are advanced optical lithography systems designed to accurately pattern sub-micron & nano-scale features on semiconductor wafers. The systems offer superior optical performance and are equipped with advanced process monitoring technology. NIKON FX 701 and FX 901 systems employ two separate inspection and fabrication (or "process") steps. First, the optical projection system uses a highly detailed stepper lens to image the market pattern onto the wafer. The lens assembly has several distinctive features, including extrememly high temperature stability, which is extremely critical in lithography applications. The second step is a manufacturing process which uses optical laser-illumination to precisely pattern the submicron features of the wafer by exposing only designated regions. The FX 701 and FX 901 systems offer an exceptionally high precision and superior imaging quality, due to a 6-inch scan range and longer stage travel. This superior imaging resolution allows NIKON wafer stepper to create highly accurate patterns for advanced nano-scale device fabrication. In addition to creating highly detailed submicron patterns, NIKON FX 701 and FX 901 stepper also delivers on-the-fly monitoring, allowing for on-the-spot process adjustment. This advanced process monitoring makes NIKON wafer stepper a reliable and efficient tool for today's demanding semiconductor fabrication applications. The FX 701 and FX 901 wafer steppers also include a patented registration feature which increases wafer throughput and accuracy. The registration feature automates several tasks, including panning, multiple alignment and pattern correction, by precisely scanning the wafer. This further improves process consistency and accuracy. Overall, NIKON FX 701 and FX 901 wafer steppers are advanced lithography systems designed for precision nano-scale fabrication of semiconductor wafers. The FX 701 and FX 901 systems utilize extremely precise stepper lenses, specialized laser-illumination techniques, and advanced process monitoring systems to create highly detailed submicron patterns. In addition, the systems include a patented registration feature which increases wafer throughput and accuracy. The combination of these features makes NIKON FX 701 and FX 901 wafer steppers an effective and reliable tool for today's advanced nanotechnology applications.
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