Used NIKON G7 #293606917 for sale

NIKON G7 is a wafer stepper that is used to produce microelectronics and thin-film devices. It is the latest model from the G series of steppers from NIKON Corporation, and is designed to be used in applications where high throughput and device uniformity are of utmost importance. NIKON G 7 is equipped with a large variety of interchangeable lenses and features a highly precise, auto-focusing nano-positioning stage. G7 is designed to process devices with a feature size down to 0.1 micron, therefore allowing devices with high resolution and accuracy to be manufactured. This stepper is capable of working with a variety of wafer formats, including the commonly used 4-inch and 6-inch sizes, which is well-suited for fabrication processes with thin film devices. G 7 has a high-performance optical equipment consisting of a high-NA condenser, a high-magnification objective lens and a large field diaphragm that can be adjusted to allow for precise control of the various types of illumination used in wafer fabrication. Advanced imaging systems are also included, such as light sensing and pre-quadrature control to allow for precise shot overlap control. In addition, NIKON G7 is equipped with an auto-exposure camera system that can be used for pre- and post-exposure imaging. This unit is equipped with various image processing functions such as photo and video recording, fluorescent image improvements and image registration. This machine is designed to provide accurate data on the device before and after it is exposed. NIKON G 7 features a number of other features such as high-speed, precise and repeatable alignment, precise and repeatable pattern scanning, adjustable and precise cutting blades, high-speed shutter adjustment, and auto-focus setting. This machine is designed to be used in demanding cleanroom environments, while providing best-in-class performance, repeatability, stabilty and accuracy. Overall, G7 is an advanced wafer stepper that provides comprehensive features, precise accuracy and repeatability for both thin-film and microelectronic device fabrication. Its high-velocity tool and image processing functions ensure high throughput and device uniformity, making it an ideal choice for applications requiring precise and highly reliable device processing.