Used NIKON i10C #293658132 for sale

NIKON i10C is a wafer stepper, a type of tool used in lithographic microlithography. This type of equipment is used in the semiconductor industry in order to allocate components or patterns to wafers by using a light source and precision optics. NIKON I 10 C equipment is specifically designed to allow for high-precision patterning with a minimal amount of complexity. It combines the latest imaging and alignment technology with a simple, user friendly interface and automated processes. I10C system has an advanced imaging and alignment unit, allowing for the highest accuracy in pattern creation and placement. This machine features two scanners, a pair of wafer stages, and a stage-viewing and positioning alignment tool, all operating together to produce results with very fine accuracy. I 10 C asset has been designed for easy use, and is suitable for both manual and automated operations. For increased efficiency and flexibility, a wide range of wafer sizes from 50 mm to 300 mm can be processed in the same model. The unique motorized wafer-handling mechanism used by the equipment ensures that every wafer is handled correctly, and also can be used in overlay applications. NIKON i10C system is equipped with exposure calibration and metrology functions that enable the highest levels of exposure precision. The unit also has a built-in shutter control mechanism that enables the user to control the exposure among various increments. These features are used to ensure higher accuracy, efficiency and wafer pattern quality. NIKON I 10 C machine has a number of exciting features, including automated interface walk-throughs, information logging, exposure retry, exposure history, and exposure log management. This features are designed to streamline the pattern printing process and allow for faster turnaround times. Overall, i10C is a high-precision wafer stepper tool designed for efficient and accurate lithography. It is suitable for both manual and automated operations, and its advanced features allow for high levels of exposure accuracy and quality patterning.