Used NIKON i11C #293600659 for sale

NIKON i11C wafer stepper is the latest edition of NIKON line of wafer steppers, enabling efficient and accurate semiconductor production. It is the first model to be equipped with a new high-power projection lens, the i-LIGHT Lens™, providing clear, high-resolution lithography with a wide numerical aperture. The main component of i11C is its i-LIGHT Lens™, which combines two counter-rotating cylindrical mirrors. This allows its wide numerical aperture of 0.325 and its immaculate resolution of 65nm to be achieved. This projection lens is able to efficiently scan wide resist thicknesses with fast exposures. The i11 series has been designed with optimized wafer-processing capabilities. This includes the ability to efficiently handle not only standard semiconductor wafers, but also ultra-thin wafers, metal-on-insulator (MOI) wafers, and more. Accurate, high-throughput imaging is enabled by parallel processing and advanced auto-focus technology. The i11 series incorporates numerous precision technologies to ensure optimal wafer alignment and wafer flattening. Its latest High Aspect Ratio Exposure System (HARES) quickly and accurately aligns wafers with uneven surfaces and edges, by utilizing an enlarged exposure area and an expanded diversity range. The wafer stepper also records information essential for advanced process control and quality assurance. Data concerning conditions, such as stage position, lens displacement and overlay, is tracked and stored for later analysis. . This allows for great accuracy and reproducibility of patterns, enabling NIKON i11C to meet the high demands of advanced semiconductor manufacturing. To enable efficient development and operation, i11C is outfitted with a comprehensive suite of software. This includes a variety of process-design tools and utilities. Additionally, networking features are included. These features allow communication with other NIKON systems, giving users the flexibility to link up with other production tools. Overall, NIKON i11C is a powerful, versatile tool which provides improved control and accuracy over conventional wafer steppers. It is ideally suited for challenging lithography tasks, such as contact opening and etching step processes. By utilizing its high-performance projection lens and optimized wafer-processing capabilities, it provides the efficiency and accuracy needed to support semiconductor manufacturing.