Used NIKON i11D #9118194 for sale

NIKON i11D
Manufacturer
NIKON
Model
i11D
ID: 9118194
Steppers
NIKON i11D is a high-performance, high-precision device for photolithographic exposure of electronic circuit patterns onto semiconductor substrates. It is a full field stepper that uses advanced optics, reduced illumination, and high resolution imaging to accurately pattern a breadth of devices on a single wafer. It is used for general circuit processing but is most commonly used for fabrication of complex and prototyping of advanced semiconductor devices and MEMS circuits. NIKON I 11 D utilizes a photomask, a element with metallic patterned areas, to define the circuit patterns on the wafer substrate. A laser beam is directed onto the mask and the reflected light is demagnified and directed onto the substrate. This process is repeated up to 16 times to create a fully formed wafer. The stepper can produce advanced circuit patterns with sizes ranging from 12 μU and below. I11D is an efficient tool enabling users to maximize their substrates. The device is built with an advanced 5-piece SMIF (Standard Mechanical Interface Format) hardware and a high-resolution optical system. The stepper features a unique 'spot print' technology to maximize die size and reduce critical dimension variation. The stepper is also designed with an illumination uniformity to maximize chip yield in the manufacturing process. I 11 D involves a variety of imaging software to support such as CATS SE2, NIKON proprietary imaging software that allows operators to easily control the stepper with a user-friendly interface. CATS SE2 has customizable feature sets, viewing tools, and analysis tools to help precisely adjust the project's parameters. NIKON i11D is capable of achieving excellent performance and yields for a variety of photolithography applications. The overall system provides a high-quality imaging system and is well-suited for prototyping or medium to small volume production. NIKON I 11 D is key to the production cycle and provides users with a reliable and repeatable photolithography process.
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