Used NIKON i12D #293823356 for sale

NIKON i12D is a stepper designed for lithography and microfabrication processes. It is an optical lithography machine that utilizes either standard or high numerical aperture optics. I12D is composed of multiple components, including an airborne optics platform, a coarse and fine motion stage, a reticle equipment, and exposure/process controls. The optics platform of NIKON i12D is composed of a NIKON three-camera design, which utilizes a central main exposure prism and two lateral cameras to capture the complete field of view of a semiconductor wafer. This enables the exacting positioning of the optics for an optimal lithography exposure and repeatable performance. The optics platform offers 0.75- and 0.5NA optical systems for transparent and reflective masks, and a numerical aperture of up to 0.1NA for high conductivity lithography applications. The optics are 6.35mm in diameter, offer uninterrupted optical line of sight, and are suitable for manufacturing sizes up to 200mm². The Nanometer-accurate stage of i12D is equipped with a high-precision NIP fluorine-coated linear guide, as well as a Nanometric Motion Control (NMC) System, which uses auto-positioning to allow up to +-200μm of hopping motion. The coarse motion stage has a maximum motion range of 50mm while the fine motion stage provides a maximum range of 16mm. Both stages are controlled through a precision guiding unit. NIKON i12D's reticle machine uses the Reticle Exchange Tool (RES) to transfer pattern masks from the stocker. This asset utilizes automated alignment to minimize setup time and reduce the cycle time for exposure. Finally, i12D's exposure/process controls offers adjustable exposure parameters, including exposure time and laser power intensity, as well as process settings, such as process temperature, heating/cooling rates, and process times. NIKON i12D can also be programmed for one-touch operation. In conclusion, i12D is an advanced stepper specifically designed for lithography and microfabrication processes. It features a three-camera optics platform, a Nanometer-accurate stage, a Reticle Exchange Model, and adjustable exposure and process settings. This wafer stepper is suitable for semiconductor wafer sizes up to 200mm², offering optimal lithography exposure, efficient processing, and precision guiding.