Used NIKON I6 #9144950 for sale

NIKON I6 is a state-of-the-art wafer stepper designed for lithography processes. The device has an advanced equipment architecture, high-precision operations, and a wide range of functions, specifically with its optical functions. I6 has a precision stage with a XY stroke of 25mm. This allows for high accuracy processing which is essential for success in lithography. Additionally, NIKON I6 has a high accuracy closed-loop system with an auto-focus function and compensation mechanism for height differences between different points on the wafer. I6 also features a 3-dimensional surface sensing unit which enables the precise alignment of the substrate to the wafer's surface. This helps to ensure the accuracy and consistency of the lithography process. Additionally, NIKON I6 is built with an off-axis projection optical unit which allows for high-precision imaging. The machine also includes an auto-artwork matching mechanism which allows for accurate alignment of the artworks to the photomask. This assists in ensuring the accuracy of exposure. Furthermore, the tool includes an in-situ auto correction of the alignment in order to account for any drift during the exposure process. The optics of I6 are built to support a wide range of resolutions. The device can process 30nm features as well as 200-micron patterns with high accuracy and precision. Additionally, the plate-to-plate repeatability of NIKON I6 is ±0.1nm. Moreover, I6 is built with a full range of sensors and controllers for precise measurement and control. This includes a metrology asset which can precisely measure the alignment accuracy of the mask and wafer. The sensor model can also measure the overlapped area between adjacent patterns, as well as analyze patterns after exposure. NIKON I6 is a powerful and versatile wafer stepper designed to provide accurate and precise results for lithography applications. With its advanced equipment architecture, high-precision operations, and wide range of functions, I6 is an ideal device for use in modern semiconductor lithography processes.