Used NIKON i7 #293606909 for sale

NIKON i7
Manufacturer
NIKON
Model
i7
ID: 293606909
Stepper.
NIKON i7 is a type of wafer stepper designed to produce semiconductor devices such as integrated circuits (ICs) and MEMS. It uses a focused ion beam (FIB) to precisely image the required pattern on a wafer using charged particles and a complex series of optics. NIKON I 7 is a high-efficiency, high-resolution, cost-efficient equipment that is used for micron and nanometer-level lithography. The system can also be modified to support a variety of operations and processes. I7 utilizes an advanced PowerSource 300 ion source and a Minilith VUV-NP optical lithography unit. This technology uses a focused ion beam to create structures with high accuracy and very short wavelengths. It can accurately print down to 50 nanometers. The FIB is accelerated and focused through the Minilith VUV-NP optics, which allows for the imaging of very small structures. I 7 also uses a proprietary high-speed stage that can position a wafer accurately in a matter of seconds. It positions the fiber relative to the workpiece with a resolution of 0.5 micrometers, which is accurate enough for use in the most advanced semiconductor processes. NIKON i7's automated delivery machine ensures that wafers are always in the correct position for exposures. NIKON I 7 is renowned for its design that maintains a stable lithography environment, which is essential for the most advanced semiconductor processes. It can withstand rapid temperature changes and shifts, which helps maintain exposure quality as well as speed of production. I7 also features advanced lithography analysis functions for on-the-spot design and process checks. This helps ensure that circuits and devices are properly developed, as well as providing a comprehensive, integrated report that can be used to help improve future design cycles. Overall, I 7 is an advanced and cost-effective wafer stepper that can be used to produce a wide range of semiconductor devices and circuits with accuracy and speed. It utilizes sophisticated lithography techniques and automated delivery systems to ensure optimum exposure quality, while also providing a range of analysis options to help ensure optimal production.
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