Used NIKON i7 #9353968 for sale

NIKON i7 is an advanced wafer stepper designed for fabrication of semiconductor integrated circuits. The device offers high accuracy and resolution with a resolution of 0.1 micrometer and a field size of 4 x 8 inches. It is equipped with two stage 5 axes and offers fast scan over the entire wafer surface in a coordinated manner. This enables higher throughput for exposure and scanning applications. NIKON I 7 features a high-speed scan controller that supports a wide range of processing times, from 100 to 2500 seconds. This ensures fast and accurate motion control while speeding up the overall throughput. The wafer stepper also offers alignment systems with both thermal and laser based sensors to ensure high precision. I7 also supports advanced lithography features such as 1X-4X multi-level lithography, multi-focus, and pupil correction capabilities. These capabilities allow for high-throughput for high density patterning and provide high yield for multiple patterning. Further, the device features a laser-based exposure equipment allowing for full-field exposures of intricate structures. In terms of design, I 7 is designed to be user-friendly and efficient. It has a self-optimizing sensor, touch panel, and a camera based system that allows for precise monitoring of processes. The device also features integrated data logging and job tracking systems that help provide analysis and productivity metrics. In addition, a color graphical user interface (GUI) allows operators to easily switch between exposures and exposures algorithms. NIKON i7 also comes with a comprehensive suite of programming tools such as Photomask design, Wafer Map Alarm, Pattern Repair Automation, Auto exposure, and Edge Tracing. These tools enable fast and automated design and alignment operations while ensuring high-accuracy. This makes the device ideal for process optimization and repeatable results. Its modular construction allows for flexibility and easy integration into existing lithography systems. Finally, NIKON I 7 offers advanced control options that allow users to dynamically monitor and adjust for errors during operation. This helps increase efficiency and optimize the process in real-time. The unit also offers a machine level library that includes self-explanatory algorithms as well as parameters to allow users to customize settings. Overall, i7 offers comprehensive control and flexibility, making it an ideal choice for high-precision lithography applications.