Used NIKON i8 #293593221 for sale

NIKON i8
Manufacturer
NIKON
Model
i8
ID: 293593221
Stepper.
NIKON i8 is a lithography wafer stepper designed for use in semiconductor fabrication facilities. This device is capable of performing diverse photolithography operations ranging from word line patterning to double-patterning and stacking layers. NIKON I 8 is equipped with a variety of latest-generation semiconductor lithography components, including two high-NA lenses for extreme resolution and uniformity. The system also comes with a large variety of stepper stages, precise positioning mechanisms, illumination systems, metrology instruments, and cellular robotics for precise alignment and patterning. With its rotating scan field and advanced high-resolution imaging capabilities, i8 can handle large-scale lithography processes as well as small jobs. I 8 offers a range of performance enhancements, including high-precision alignment and wafer scanning capabilities. It features a highly-accurate positioning stage, with nanometer resolution and repeatability, enabling precise overlay and placement of masks and templates. NIKON i8 has a high-NA projection lens which provides the flexibility to accurately print features ranging in sizes 0.1µm or greater. This allows it to make patterns with extreme precision, and print ultra large-scale integration (ULSI) semiconductor devices with even greater detail. The projection lens is combined with a programmable uniform field illumination system, allowing users to define precision illumination parameters as required. Additionally, NIKON I 8 includes an advanced metrology module, which assesses positioning accuracy and layer overlay. This provides users with an understanding of the printing accuracy, and helps with pattern verification and correction processes. I8 is also capable of stack-layer processing and double-patterning. By using its auto-alignment feature and advanced robotics, the device can handle complex jobs such as 3D device structures, and can also etch portions of resist patterns without compromising any underlying layers. The device also enables high throughput and low defect rates, enabled by its automated robotic handling process and its fast wafer exchange speed. Finally, I 8 is designed to have a small footprint, making it easy to install in a variety of settings. Its robust construction also ensures reliability in even the most challenging manufacturing environments. In combination with its advanced features, this makes NIKON i8 a superior solution for semiconductor lithography needs.
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