Used NIKON NES1 H04 #9356064 for sale

NIKON NES1 H04 is a wafer stepper, a precise tool for creating photomasks used for printing integrated circuits. The equipment offers users an extremely high-resolution exposure system comprised of a highly accurate Digitally Controlled Mode (DCM) stepper which ensures precise and repeatable exposure of photomasks. NIKON NES1-H04 utilizes powerful 8.4-micron micro-focus optics, providing a full resolution of 0.5 micron with an accuracy of +/-1.5um and a repeatability of +/-3um. It additionally features an innovative subfield-level stepper, which offers a precision of 0.2 micron. Its 0.5 second step-and-repeat time allows for fast and uninterrupted operation in most high-volume printing environments, and integrated Repeatability Error Compensation (REC) technology further improves the task of lithography. The wafer stepper also boasts a highly sensitive charge-coupled device (CCD) camera for monitoring sample integrity and positional accuracy. This CCD camera is highly sensitive, utilizing a CCD with a 12.3 Megapixel resolution at a frame rate of 10 frames per second, allowing for detailed analysis of specimens during photomask fabrication. In addition, the unit incorporates a special proprietary chamber design, which ensures uniform sealed pressure while allowing for gas flows to be adjusted to suit the specific circumstance. This allows users to easily tailor the machine for a variety of applications, such as partial exposure. Accompanying these features is a range of automated operations for precise alignment and focus, including an objective lens autofocus, auto-zeroing and auto-reticle centering. These smart capabilities help users to precisely position wafers for optimum exposure with minimal effort. All in all, NES1 H04 offers advanced capabilities for achieving superior lithography results, significantly reducing photomask fabrication time and cost and providing users with the highest level of performance and reliability.