Used NIKON NES1 H04 #9356979 for sale

NIKON NES1 H04 is a wafer stepper designed to fabricate integrated circuits on semiconductor substrates at the micro and nanometer scale. As the most advanced and capable model in NIKON series, NIKON NES1-H04 is capable of achieving resolutions of down to 0.28μm, allowing for cutting-edge nanoelectronic device production. NES1 H04 features advanced 5-axis alignment capabilities, which enable superior placement accuracy and repeatability for a variety of integrated circuits and photomasks. In addition, NES1-H04 features high-precision X-Y-Z stages for superior computational performance. Using the integral Java object-oriented control language, the user can access a wide range of stepper functions with minimal programming and debugging time. The lens system of NIKON NES1 H04 consists of two coaxial beam paths, with one path directing the exposure light along the X-Y stage while the other is directed through the projection lens system. This allows operation at relatively short exposure times, while also providing process stability and repeatability despite environmental and manufacturing variations. The stepper also offers a variety of exposure and imaging modes, enabling the user to configure the system for specific processes and materials. Features such as die to die, die to wafer, step & repeat, and single exposure modes ensure maximum control and efficiency, while an integrated Photosensor provides accurate exposure feedback for added safety and reliability. NIKON NES1-H04 is constructed from highly durable components, with features such as a double-walled cover, auto-lockingdoors and a unitized body for vibration and dust resistance. In addition, the TCL-based on-board manual test program enables the user to identify and debug any issues quickly and effectively. Overall, NES1 H04 is one of the leading wafer steppers in the nanoelectronics industry, featuring some of the most advanced features and capabilities available. Its exceptional resolution, high-precision stages, fast optics and wide range of exposure options allow the user to confidently and quickly fabricate high-quality integrated circuits and photomasks, resulting in superior product yields.