Used NIKON NES1 H4 #9239624 for sale

NIKON NES1 H4 is a semi-automated high-precision stepper used in the production of semiconductor wafer substrates. The H4 wafer stepper provides high yield and superior accuracy at 10μm and better. It is equipped with a variety of features and has been used for over 15 years in the semiconductor industry. NES1 H4 is a single-field stepper with a field size of 56.4 x 56.4mm and a maximum stage size of 25.4 x 25.4mm. The stepper is equipped with a multi-patterning Rotation Stage (MPRS) for 360-degree precision alignment. The H4 wafer stepper has a maximum resolution of 0.1μm over a 500 mm range. The stepper is equipped with an alignment/exposure equipment consisting of a placement microscope, laser displacement sensor, and alignment improvement processor. It also features a high-precision projector lens, sampling alignment, and beam polarization control. NIKON NES1 H4 has a wavelength range that supports the use of both deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography. The stepper is compatible with both i-line and KrF lasers, and it is designed to work with up to four different laser sources. The stepper is also equipped with software and hardware tools to reduce optical distortion, field uniformity, and print quality. The wafer stepper is capable of handling a variety of wafer substrates such as single- and double-side photomasks, surface-mounted devices, and gapless metal-insulator-metal (MIM) devices. It is also capable of patterning a wide range of substrates with high-precision. Additionally, NES1 H4 has a variety of feature enhancement modes that make it capable of producing rigid, sub-micron structures with minimized wall-angle variation, as well as superior overlay accuracy, uniform focus, and higher throughput. In terms of safety measures, NIKON NES1 H4 is designed to be compliant with the International Standard Organization (ISO) safety standards. The stepper's interlock system protects against unplanned laser exposure and its dust prevention features reduce the risk of contamination. The protective coating on the stepper prevents damage from ionizing radiation, and the unit's EEPROM is designed to protect against electromagnetic interference. Overall, NES1 H4 wafer stepper is an advanced technology that provides superior accuracy, high yield, and reliability. The machine is capable of accurately patterning a wide range of substrates and is designed with a variety of safety features for safer production operations.