Used NIKON NESIW-i06 #9364622 for sale

NIKON NESIW-i06 Wafer Stepper is a next-generation lithography equipment with a fully automated system for wafer imaging. It is designed to provide high precision, high throughput, and productivity with advanced wafer stage control for tighter structure fabrication tolerances. NESIW-i06 boasts of high-resolution and high-precision exposure systems with advanced image correction and processing capabilities. The wafer stepper's exposure unit utilizes a high-quality laser illumination source for higher image quality. This ensures that the overlay accuracy and line width control are well-maintained. The low thermal noise also ensures repeatable and reliable performance. The amplitude of the laser illumination is actively managed, resulting in a desirable balance between exposure speed and image quality. The high precision exposure machine, together with the laser illumination source, provide accurate exposure of the wafer within the tight structure fabrication tolerances. NIKON NESIW-i06 Wafer Stepper is powered by advanced automation and stage control. This automation tool uses a patented two stage, X-Y combination stage that provides for a single plane movement. This simplifies wafer exposure operations and ensures that more accurate wafer structures can be produced. The stage control asset also offers advanced features such as alignment marks detection capabilities that enhance the accuracy of wafer images. In addition, NESIW-i06 includes advanced image processing controls. These controls use a combination of image intensifiers and a CCD detector to provide automatic compensation for illumination source variations. This also ensures repeatable and reliable accuracy for all imaging operations. Further enhancing the capabilities of NIKON NESIW-i06 Wafer Stepper is its low cost of ownership due to its minimal maintenance requirements. Overall, NESIW-i06 Wafer Stepper is an advanced lithography model with the latest technologies that guarantee superior performance and increased throughput for greater wafer imaging accuracy. This equipment is the perfect choice for those looking for a high-end system with superior imaging capabilities.