Used NIKON NSR 1505 G4D #9226100 for sale

NIKON NSR 1505 G4D
Manufacturer
NIKON
Model
NSR 1505 G4D
ID: 9226100
Wafer Size: 6"
Wafer steppers, 6".
NIKON NSR 1505 G4D wafer stepper is an advanced photolithography system designed for semiconductor and integrated circuit manufacturing. It is capable of carrying out a wide range of processes such as exposure, resist coating, and resist development. NIKON NSR 1505 G 4 D is equipped with a high-precision two-axis scanning stage and a 340 nm, 4 mJ ArF laser source, providing up to 4 times greater photo-response along with significantly improved overlay registration accuracy when compared to conventional laser sources. The increased precision of exposure patterns is used to produce finer lines and patterns, enabling the production of a greater range of components with higher precision. NSR 1505 G4D has a maximum stage travel distance of 355 mm (14" in diameter) and a minimum of 0.5 μm resolution. The stepper has an extreme focus on process control and accuracy, as well as a user-friendly interface, ensuring that its operation is both efficient and reliable. NSR 1505 G 4 D is compatible with a wide range of resist materials, allowing for a variety of photolithography processes to be performed. These include: liquid immersion, advanced micromachining, SU-8, and Lighthouse Structures patterning. NIKON NSR 1505 G4D is suitable for performing high-precision patterns in the size range of 1μm to 200μm. It is also capable of producing patterns with dramatic differences in shape and size, with small features such as 0.5μm lines and spaces to large-scale features of up to 20mm in diameter. To protect the surface of the wafer, NIKON NSR 1505 G 4 D includes an advanced vacuum system which actively maintains a clean environment, as well as temperature and humidity control systems that help protect the wafer from photobleaching and other defects. In addition to its precision and reliability, NSR 1505 G4D also features a fast-exposure time and high-speed processing capabilities that allow for high-volume production. The stepper incorporates a range of safety systems for minimizing possible radiation exposure for operators and other personnel. In conclusion, NSR 1505 G 4 D is a leading photolithography system designed for use in semiconductor manufacturing. This advanced wafer stepper offers high precision, high-quality exposure patterns and increased capability, allowing for a greater range of components to be produced. It provides a whole suite of environmental protection features and safety measures, and its fast-exposure and high-speed processing capabilities drive efficiency and reliability.
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