Used NIKON NSR 1505 G6 #9236645 for sale
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NIKON NSR 1505 G6 Wafer Stepper is a device used in the photolithography process of semiconductor manufacturing. This device enables optical pattern transfer to a silicon wafer which are used to produce integrated semiconductor circuits. NSR 1505 G6 exhibits excellent performance with its large projection lens which maximizes throughput at its 6 inch wafer size. It is designed for sub-micron applications and features several features that improve device accuracy and reliability. The optical equipment of NIKON NSR 1505 G6 features an improved image plane flatness of the projection lens, finer alignment accuracy, and a larger aperture. This ensures accurate pattern continuity and improved registration stability. The device is also integrated with a real-time exposure control system known as the PALONE-E controller, which provides superior exposure accuracy and improved shift performance. The controller is also integrated with a number of features like automatic exposure control, digital image shift, and autofocus which enable precise exposure and alignment. NSR 1505 G6 is also equipped with high-precision XY-stage scanning and overlay control systems. It is designed with a magnified stitch-viewer that provides improved overlay performance and wafer inspection. It also has an improved high-speed sub-beam alignment option that enables improved alignment speed. The device is designed for high-precision imaging and utilizes an 8-bit data with a resolution of up to 30,000 pixels. The device also features a 4 inch reticle alignment accuracy and a 5 um image plane flatness. NIKON NSR 1505 G6 integrates a new photographic fire unit and a highly efficient optical filter machine. The fire tool boosts accuracy and throughput by combining short and long light source exposure. The filter asset helps to maintain optimal ISO sensitivity for uniform wafer responses. It also allows for precise exposure control while maintaining low background values. NSR 1505 G6 also features an automated humidity and particle counter that accurately monitors environmental conditions during the lithographic process. It also features a maintenance mode for timely calibration and servicing when needed. Finally, the device is integrated with a flexible automated cleaning model that can handle various process wafer sizes and formations, making the process extremely efficient. Overall, NIKON NSR 1505 G6 Wafer Stepper is an intricate device with improved precision, accuracy, and throughput. It is designed for a wide range of substrate sizes and applications, making it a reliable and efficient choice for photolithography processes.
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