Used NIKON NSR 1505 G6E #293602162 for sale

Name: NIKON NSR 1505 G6E
Brand: NIKON
SKU: 293602162
Availability: InStock

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Wafer Steppers

Manufacturer

NIKON

Model

NSR 1505 G6E

ID: 293602162

Stepper Reduction projection optical system: Numerical aperture: 0.54 Reduction ratio: 5:1 Lens distortion: Within ±0.12 µm (for X and Y) Exposure wavelength: G-Line (458 nm) Exposure area: Diameter: 24.74 mm 15 mm x 15 mm 13.42 mm x 20.14 mm Illumination optical system: Exposure power: 300 m-W/cm² Illumination uniformity: Within ±2.5% Integrated exposure stability: Within ±2% (For ≥30 mJ/cm²) Exposure time setting range: 0.05 sec to 9.9999 sec and 0 sec Ultra high pressure mercury lamp: 1000 W Auto focus system: Oblique incident light detection method Repeatability: ±0.02 µm Vertical stroke: 0.6 mm Focus offset entry range: ±30 µm.

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NIKON NSR 1505 G6E is an advanced wafer stepper designed to enable precise lithography processing at the nanometer level. The tool utilizes state-of-the-art technologies to allow for precise and highly efficient patterned imaging of silicon wafers. The equipment features a high-performance imaging stage and two independently controllable lithography stages, allowing for precise, multiple-exposure alignments to achieve high resolution imaging. The system also utilizes a high-accuracy focus detection unit to ensure precise image focuses. NIKON NSR-1505G6E is equipped with a high-speed scanning machine that supports scanning up to 6,000 mm/s and a high-accuracy positioning tool capable of achieving a positional accuracy of 1.7 nanometers. The tool is also capable of providing an elevator beam scan capability, enabling multi-pattern exposure in a single exposure step. This feature is coupled with a unique "overlapping" algorithm that allows the pattern exposure to successfully cover any design with more than 15 patterns. NSR 1505 G6E is also designed to be both user-friendly and flexible. The tool is equipped with an intuitive graphical user interface that facilitates user control and enables changes to the lithography recipe and program set. Additionally, this stepper is designed to be compatible with a number of popular lithography exposure methods including deep ultraviolet (DUV), KrF, and i-line as well as pre-defined exposure patterns. The tool also features a maintenance-free operation including a multi-layer wafer holder to secure wafers during exposure. Overall, NSR-1505G6E is a powerful and advanced wafer stepper that offers precise lithography capabilities from nanometer to micron scale. Its fast scanning asset and positioning accuracy enables efficient and precise lithography imaging that is crucial for the fabrication of chips and other electronics. The model's maintenance-free operation and user-friendly interface make it a go-to tool for organizations and individuals looking for a reliable and versatile wafer stepper for their lithography needs.