Used NIKON NSR 1505 G6E #293717119 for sale

NIKON NSR 1505 G6E is a high-precision, 5-axis wafer stepper used for photolithographic patterns within maskless lithography operations. It is furnished with x, y, z, θ, and rotation axes controls, providing superior step and repeat accuracy for critical wafer-level device operations. It also features a unique mirror scanning system for high uniformity across the entire field of imaging, including the peripheral regions, for applications that require high-resolution patterning. Internally, the system is built on an all-in-one architecture that combines its optics, imaging, motion control, and PC, eliminating the need for adding separate control components. This reduces the space needed, simplifying alignment and shortening the set-up time. NIKON NSR-1505G6E also boasts ultra-high resolving capability and excellent repeatability that allow for the recognition of scattered micro dots on the wafer by its auto-correction function. This enhances imaging quality, especially for identifying uniformity across the entire wafer field, making it ideal for fine-line patterning and other miniaturized features. NSR 1505 G6E is fully automated, with a completely operator-configurable PC-based operating software that allows operators to customize settings and program error-detection routines. It is compatible with all CAD programs and is capable of seamlessly operating with auto-controlling and step-and-repeat functions. Additionally, the system logs all data to ensure accurate patterning and minimize human error. The advanced algorithms and extended control settings incorporated in NSR-1505G6E allow for maximum control of exposure and alignment. It has a large, programmable illumination and automatic exposure control functions to allow the adjustment of exposure settings to prevent image distortion. NIKON NSR 1505 G6E is highly reliable, guaranteeing accuracy and high speed. It is powerful yet simple to use with fully integrated optics, imaging, and motion functions, making it suitable for large wafer layouts and small device manufacturing.