Used NIKON NSR 1505 G6E #293817955 for sale

NIKON NSR 1505 G6E is an advanced wafer stepper used for lithography in the semiconductor manufacturing process. It is a step-and-scan projection aligner that is capable of providing high-density exposure of chip patterns on large-diameter semiconductor substrates. The equipment is designed to accurately image up to 200mm diameter wafers and can accommodate a dual wafer process that is used to split wafers into two patterned wafers. The G6E is a multi-scan step and repeat system that is capable of delivering faster processing time and high speed. The unit is equipped with a state-of-the-art optical machine featuring a precision 0.35 numerical aperture, a high-resolution scanner, a powerful stage positioning tool, and advanced image correction technology. This combination of features enables the asset to deliver excellent overlay and placement accuracy of < 1.5 mm pitches with depths of up to 10 micrometers. The model is also equipped with a high-speed servo motor for faster exposure pulse applications, and a rugged drive equipment that ensures accurate wafer handling during exposure. The system also includes a highly efficient cooling mechanism and an advanced shutter unit for reliable exposure. NIKON NSR-1505G6E is a robust machine that is designed for reliable and efficient operation. The tool utilizes a dual CPU asset consisting of a main CPU and a wafer processing CPU. The main CPU is responsible for controlling the model while the wafer processing CPU handles the exposure processing and wafer handling. This structure offers high throughput and higher accuracy through better communication between the two CPUs. NSR 1505 G6E is also designed with user-friendly software, offering various options to meet various processing conditions. It is equipped with a multi-exposure feature, allowing users to process multiple exposures on the same wafer. This feature reduces processing time and improves overall throughput and accuracy. NSR-1505G6E is an advanced wafer stepper designed to meet the demands of the most advanced lithography processes. The equipment is equipped with a state-of-the-art optical system, advanced wafer processing technology, and user-friendly software. These features combined with its robust design allow the unit to deliver consistently high-quality exposure results.