Used NIKON NSR 1505 G6E #9276476 for sale
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ID: 9276476
Wafer Size: 6"
Stepper, 6"
Lens resolution: 0.70 µm
Lens distortion: ±100 nm
Magnification error included
Open flame:
Maximum exposure area: Square 15 mm
Vertical x horizontal: 17.5 mm x 12.5 mm
Focus check: ≤ ±0.3 µm
Lamp power: 500 mW/cm²
Lamp uniformity: 3.0%
Dose controll accuracy: ±1.0%
Integrated exposure stability
Reticle blind: 0.4- 0.8 mm
Reticle rotation accuracy: 0.03 µm
Target value repeatability: 0.02 µm
LSA Telecen: ≤ ±0.5 µm
LSA Repeatability: ≤ 0.2 µm
Overlay: ≤ ±0.15 µm
Stepping accuracy: 3σ ≤ 90 nm
Wafer stage flatness: 3.0 µm / 150 mm
Chip leveling: ≤ 0.4 µm (10 mm)
Wafer transfer:
Failure / (4) Lots wafer
Prealignment2
Repeatability: 3σ 15 µm
Wafer: Flat type
Reticle size, 5"
Wafer loader
(2) Cassette tables
Ceramic arm
Reticle loader:
PPD
Reticle, 5"
Automatic Reticle Loader (ARL)
Wafer stage
Leveling stage: X, Y, Z, T
Chip leveling
Wafer holder: Ring type, 6"
Illumination:
Lens type: 0.54
Maximum expose area: 15 mm square to 12.5(H) mm x 17.5(V) mm
Reduction ratio: 5x
Lamp power supply unit
Alignment
Laser power supply: WGA and LSA
Alignment method: WGA and LSA
Systems:
MCS2
Floppy drive for storage
Environment chamber.
NIKON NSR 1505 G6E is a high-precision wafer stepper, designed for use in semiconductor fabrication processes. This stepper provides high accuracy and speed, as well as excellent image quality for lithography and etching processes. NIKON NSR-1505G6E utilizes an advanced combination of optics and electronics to ensure superior precision and image quality. Its optical equipment includes a high numerical aperture (NA) lens, which allows for higher imaging resolution. The stepper also features a sophisticated image-processing system and a large motion range, allowing it to easily align and adjust its position to image patterns on wafers or substrates. NSR 1505 G6E is capable of producing images with a resolution of 0.25μm, which is much higher than the resolution of many other wafer steppers. It can also accurately expose multiple patterns on wafer at once, and can achieve reliable pattern repeatability by allowing for precise adjustments of position and exposure. With a high-speed scan time of 2.1 seconds, this stepper helps reduce energy consumption and minimizes the need for human intervention. NSR-1505G6E is extremely reliable and extremely easy to use. It is built with sophisticated control software, which allows users to easily monitor and adjust the operation of the stepper. This software also allows for real-time adjustments of speed and exposure, which helps reduce cost and waste by optimizing exposure time. Finally, NIKON NSR 1505 G6E is highly customizable, allowing users to configure the unit for specific applications. The stepper is available in either a single- or dual-pocket configuration, and multiple hardware modules can be added to allow for greater flexibility and control. The stepper is capable of taking multiple input formats, and can be connected to both manual and automated systems. All in all, NIKON NSR-1505G6E wafer stepper is an excellent choice for lithography and etching processes. It offers accurate, high-resolution imaging, reliable repeatability, and excellent ease of use. With an advanced optical machine, sophisticated image-processing tool, and customizable configuration, NSR 1505 G6E can help increase efficiency and reduce operating costs.
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