Used NIKON NSR 1505 G7E #293592861 for sale

NIKON NSR 1505 G7E is an advanced-performance, dual-beam, full-field stepper that is fully integrated with both 4- and 8-inch wafer scan fields. This NIKON equipment is a particularly cost-effective wafer-stepper solution. NIKON NSR-1505G7E introduces a number of technological advances to the world of advanced lithography technology. It contains advanced nanolithography components and uses high numerical aperture (NA) optics for higher exposure accuracy and wider process windows. It offers high resolution and exposure accuracy even with high magnification and an extensive process window. The high-performance exposure optics of NSR-1505 G7E include an advanced optical system, an elastomeric optical element, and a high-NA projection lens. The advanced optical unit provides high-precision imaging that is stable over a wide exposure field. The advanced optical machine is designed to achieve high alignment accuracy and high lithography exposure accuracy for large exposure fields. NSR 1505 G7E features a Single Wafer Alignment Tool (SWAS) that allows for fast and precise alignment of lithography reticles. SWAS uses advanced in-line sensors and optics to quickly and accurately measure the alignment of exposure fields without any mechanical movement. The asset allows for the integration of high-resolution aerial images with exposure topologies and exposure layouts. NSR-1505G7E also features a large-diameter wafer stage, allowing for wafers up to 8 inches in diameter to be processed. The model features an advanced wafer handling mechanism that allows for accurate and precise stages movement, offering lower overhead for production automation. Uniquely, NIKON NSR-1505 G7E offers a high productivity mode that enables high throughput with its high-speed lithography production. It also offers a low-power consumption mode, allowing it to operate at lower power levels while still producing a high throughput. Additionally, NIKON NSR 1505 G7E offers advanced built-in safety features and automated wafer handling that enables efficient lithography production. With a location-tolerant writing pattern, NIKON NSR-1505G7E is able to produce advanced pattern shapes with a high Process Window Discrimination (PWD) quality level. It also features a high-precision Pulse Shaping Architecture (PSA) for higher accuracy exposures. Finally, NSR-1505 G7E has numerous compatible accessories, including an advanced lithography process sequence editor and a specialized related software development kit (SDK). In conclusion, NSR 1505 G7E is an advanced and highly capable wafer-stepper solution. It features advanced nanolithography components, high-resolution optics, high-precision imaging, a large-diameter wafer stage, a SWAS alignment equipment, a high-speed lithography production mode, low power consumption, advanced safety features, and a specialized SDK. The combination of these elements makes NSR-1505G7E an excellent and cost-effective wafer-stepper solution.