Used NIKON NSR 1505 G7E #9195757 for sale

NIKON NSR 1505 G7E
Manufacturer
NIKON
Model
NSR 1505 G7E
ID: 9195757
Stepper.
NIKON NSR 1505 G7E wafer stepper is a high-end, precision exposure equipment for processing semiconductor integrated circuits. It is specifically designed for mass production and is capable of performing fast and accurate wafer exposure, with a highly reliable dual beam system. The G7E has a resolution of 0.5 µm and offers 13x reduction when used together with a magnification more than 180mm. This makes it ideal for fine patterning on modern production nodes. It comes equipped with a die-to-die resolution profile monitor which accurately measures the exposure dose before and after each shot to ensure proper exposure. The G7E also features a high-speed layering mode, allowing for rapid wafer processing. The unit comes with a variety of lens offsets and field mags. This ensures highly accurate exposure for low to medium-level patterns, even over the whole wafer area. The G7E offers a long-distance exposure mode, allowing for long-distance exposure and an optical aberrations correction machine (OACS) ensures the highest precision. Additionally, the tool's optics are designed with a built-in calibration mechanism, allowing maintenance personnel to quickly perform calibration checks and adjustments. The G7E incorporates a fully automated vision asset, allowing for comprehensive wafer inspections and defect detection. Additionally, the model features a cycle time optimization equipment, reducing any downtime during operation as well as an in-line wafer metrology system for monitoring the wafer thickness and size. The G7E has an easy-to-use user interface and to help accelerate ramp-up cycles, it offers an integrated sequence translation unit, which automatically translates the design data into production-friendly format. Moreover, it comes equipped with an instant feedback machine, which offers real-time information on the progress of the exposure window. NIKON NSR-1505G7E wafer stepper is one of the most advanced and high-precision exposure systems available in the market today. With its high-precision optics, built-in calibration mechanism and intuitive user interface, this tool provides an excellent solution for wafer processing needs.
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