Used NIKON NSR 1505 G7E #9386319 for sale
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ID: 9386319
Wafer Size: 6"
Vintage: 1990
Stepper, 6"
ASAHI S75 Chamber
Chamber temperature: 23°C
Fixed reticle microscope, 15mm
PDP-11/73 Computer
HP 5517A Laser
LSA Laser: 5 mW
ITV Camera
Wafer condition: Silicon
OF Detection
Wafer loader: Type 1
Wafer carrier table: Left / Right
Reticle, 5"
No lens data
Rack type: Right
Electric source: NEMA Box
CVCF
1/2 Switch
1990 vintage.
NIKON NSR 1505 G7E is a high-performance wafer stepper from NIKON that offers excellent accuracy and throughput for lithographic applications. It is the most advanced stepper of its class, with an industry-leading ±4 µm for pattern placement accuracy and ±10 nm for CD uniformity. Built with a superchromatic Chromatic Aberration Reduction Optical Equipment (CAROS), it provides superior imaging quality and the highest degree of pattern fidelity and repeatability. NIKON NSR-1505G7E features light sources with up to 250 W, multiple exposure modes, and exposure energy 7. It has a large optics field of 5.5 inch x 5.5 inch and an enhanced resolution of 140 nm or below. The stepper utilizes a unique RCAS (Robust Corrective Algorithm Shaping) optical system for superior pattern development, characterized by low lens distortion and projection accuracy differences with highly reduced aberration values. For exposure accuracy, the G7E offers the innovative "Exposure Ratio Monitor" that provides real-time feedback to maintain the best edge ringing and distortion properties. NSR-1505 G7E includes an automatic dichroic color filter turret that allows easy changes of the illumination spectrum. It is also equipped with an auto-focus unit that simplifies corrections to field flatness, as well as variable laser/intra-field flatness/correction rods that support high-accuracy wafer scanning. The exposure accuracy of the G7E is further enhanced by a "Best-Fit Principle" that provides optimal exposure energy settings and recipe development. Other features of NSR 1505 G7E include an air-cooled focal plane shutter, an automated wafer alignment machine, two stages of wafer speed adjustment to match the desired resolution, and an on-board OS that provides better data management and security. By providing superior imaging and accuracy, the G7E is the industry standard for wafer stepper technology. It is well-suited for a wide range of applications from fabless chip manufacturing to high-end imaging solutions, such as MEMS, nano-lithography, and micro-electronic production.
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