Used NIKON NSR 1505 i10D #146913 for sale
URL successfully copied!
ID: 146913
Wafer Size: 6"
Stepper, 6"
Performance Specification:
Expose Source: i-Line (365nm)
Reduction Ratio: 5:1
Lens: 5IB5
Expose Field: 20mm Diameter -15mm x 15mm
Exposure power: >800mW/cm2
Alignment System: LLTC, FIA, SLTC
Hardware Configuration:
Wafer loader: 6" wafer stage
Wafer Loader: Type II
Cassette Elevators: 2
Wafer stage interferometer system
Reticle loader: Single Six
Reticle alignment system: SRA/ISS
Auto-Reticle blind system
Auto-focus system
Currently in a cleanroom.
NIKON NSR 1505 i10D is a high-precision, advanced wafer stepper for semiconductor chip production. It is equipped with cutting edge optomechatronic technologies, delivering accuracy and throughput for demanding, high-volume lithography needs. NSR 1505 i10D features 10nm laser patterning, 1 nm overlay accuracy and a 250 mm field area. It is capable of quickly and accurately exposing 1-3 pattern layers per wafer, and its 1 mm C-shaped stage is designed to reduce stage stress and vibration induced pattern placement errors. It also comes with a high-end single-angular illumination system for superior illumination uniformity, enabling extremely dense patterning. NIKON NSR 1505 i10D's optomechatronics provide superior lithography performance. It features a proprietary 4-micron piezo-driven linear motion stage, which ensures simultaneous motion of the wafer and stage with high stability. Additionally, the wafer-stage-based approach extends the stepper's compensation range to 250 μm and allows efficient on-the-fly compensation for local and global distortions. Furthermore, NIKON InCelli Transfer Technology offers non-contact wafer transfer to reduce the footprint of the stepper by eliminating the need for an external transfer device. The macro-preview function analyzes main feature of the layout prior to exposure and compensates global pattern distortion, while selecting proper focus and overlay values to optimize the exposure strategy. NSR 1505 i10D also comes with a specialized illumination head designed for improvements in particle-free patterning. This helps to reduce particles caused by Oil-free particles and photoresist mixing, as well as 3-beam simultaneous irradiation to improve by-pass inspection performance. It is backed by a comprehensive service package that delivers best-in-class tool availability and efficient maintenance with a minimized number of interruption hours. The stepper's user-friendly environment includes high-end PASIV™ graphical user interface and extensive operations customization possibilities. Overall, NIKON NSR 1505 i10D is an advanced, highly precise wafer stepper for the production of semiconductor chips, with cutting edge optomechatronic technologies that provide excellent accuracy and throughput for demanding, high-volume lithography needs.
There are no reviews yet