Used NIKON NSR 1505 i7A #9299960 for sale

NIKON NSR 1505 i7A wafer stepper is an advanced high-precision lithography equipment designed for mass production of semiconductor devices. NIKON NSR-1505I7A offers unrivaled performance and is ideal for medium and low volume deposition of photomasks and other products. It features a fully automated, fast-changer loader/unloader that enables simultaneous exchange of wafers, masks, plates and substrates. NSR 1505 I7A is equipped with NIKON state-of-the-art CCD wide-field imaging systems and advanced optics for precise optical alignment of wafer and photomasks. The imaging systems enables high-resolution imaging, enabling very small device feature sizes to be resolved with exceptional accuracy. The CCD imaging system consists of two sets of lenses and a high-resolution CCD camera optimized for lithography. The CCD camera has a maximum imaging area of 256mm x 256mm to support all standard photomask and wafer sizes. Wafer mapping, edge detection, and alignment using the camera provides precise alignment of mask and wafer. The unit also features a high-performance Chamber One resists retrieval machine designed to reduce resist removal time and minimize resist consumption. It includes a high-vacuum chamber, a one-stage transfer tool, and a high-pressure carbon dioxide jets asset for effective resist removal. The model also features a high-accuracy exposure equipment designed to deliver highly accurate resist exposure with excellent uniformity across the entire wafer surface. NIKON NSR 1505 I 7 A also features a high-precision staging system that supports smooth and accurate placement and movement of wafers and photomasks. The unit includes a high-speed shaker and high-resolution actuators for precise adjustment of wafer and photos placement. The staging machine is also equipped with a scalable wafer tracking tool that can be adjusted to support multiple wafers while enabling manual wafer removal for critical operations. NSR 1505 I 7 A is also equipped with a specialized inspection and alignment asset that can detect defects and perform precise alignment and image correction. The model can detect particles smaller than 2 microns and features NIKON multi-step pattern recognition equipment for fast and accurate alignment. The system also supports alignment of wafers after deposition and exposure process to ensure the highest quality of the process. NIKON NSR 1505 I7A is an advanced, high-precision wafer stepper perfect for medium to low volume lithography operations. It provides outstanding accuracy and uniformity for photomask and wafer production, and its fully automated exchange unit and high-performance resist retrieval and inspection systems enable efficient and consistently high-quality results.