Used NIKON NSR 1755 G7A #9215745 for sale

NIKON NSR 1755 G7A is a wafer stepper that is designed for high-speed and precise photolithography applications. It utilizes a unique and highly accurate alignment equipment and provides a wide range of useful features, making it highly suitable for semiconductor production. NIKON NSR-1755G7A utilizes a two-dimensional alignment system to determine the exact position of each wafer. This advanced unit is accurate and repeatable, ensuring that high-resolution patterns are consistently produced with each exposure. Furthermore, the machine features a 7-axis positioning tool, providing high accuracy even when handling multiple substrates. Using the advanced features of NSR-1755 G7A wafer stepper, users are able to precisely control the exposure process. This helps to ensure that each wafer is accurately exposed with the desired patterning precision. Additionally, the stepper has a long exposure time range and is capable of delivering extremely long exposures of up to two hours. The design of NIKON NSR-1755 G7A wafer stepper is also highly efficient. It has been designed in a compact form factor, helping to reduce the size of the stepper while keeping its core features intact. Additionally, the stepper is equipped with a 4x5 autofocus asset, allowing multiple wafer exposures to be automatically corrected for. In terms of performance, NSR 1755 G7A is equipped with features that help it to consistently produce accurate images. It utilizes a combination of laser-based photo-diode array (PDA) and optical metrology to measure each exposure. This enhances the accuracy of the results, allowing users to confidently reproduce results with high accuracy. Additionally, the wafer stepper is equipped with a high-accuracy auto-fiducial alignment model and provides a wide range of imaging process parameters. NSR-1755G7A is a highly efficient and reliable wafer stepper. Its unique equipment design and efficiency make it highly suitable for lithography processes in advanced semiconductor production. Its wide range of features, including precise alignment and exposure control, along with robust imaging performance makes this a highly desirable system for modern semiconductor production.