Used NIKON NSR 1755 G7A #9226367 for sale

NIKON NSR 1755 G7A is a 5-axis wafer stepper equipped with advanced telecentric optics and an advanced 180° shutter with maximum alignment accuracy. Its high dust protection prevents particles from entering the machine, ensuring reliable wafer processing. NIKON NSR-1755G7A features high-precision and high-speed pattern generation with 0.1 μm/pixel resolution and 21 nm shot size accuracy, as well as a low-footprint and high-productivity design. The stepper is built with a dual chucking mechanism for handling both 200 and 300 mm substrates. It is equipped with a large-capacity cassette loader that can hold up to 7 cassettes and provides seamless substrate transfer, preventing time loss and improving production efficiency. The stepper is designed to facilitate excellent resolution, precise alignment, and optimized throughput. Its telecentric optics is capable of reducing aberrations, while the 180° shutter function ensures high-precision alignment and offers improved alignment of lines formed at each exposure site. The shutter angle can be easily adjusted for fine tuning patterns. Furthermore, its dual chucking method reduces total system throughput and provides efficient handling of both 200 and 300 mm substrates. Using NSR-1755 G7A, users can access various process modules like lithography, wafer exposure, film developing and plasma etching. The lithography module provides 5-axis motion of wafers and various sensing functions, allowing for precise exposure of features. The wafer exposure module is capable of high-precision printing with a resolution of 0.1 μm/pixel and powder losses by singulation. The film developing module also offers high-productivity processing with its optimized Cassette transfer system. Finally, the plasma etching module offers users the capability to etch features with 10 μm resolution. Overall, NIKON NSR-1755 G7A is a high-performance wafer stepper well-suited for precision lithography and wafer processing. It is equipped with advanced telecentric optics, a 180° shutter, and a dual chucking mechanism for efficient substrate handling. The stepper is capable of providing a high-precision, high-speed pattern generation with 0.1 μm/pixel resolution and 21 nm shot size accuracy. With its various process modules, NSR 1755 G7A is an ideal equipment for fine-tuning small features with excellent resolution and throughput.