Used NIKON NSR 1755 G7A #9227621 for sale

NIKON NSR 1755 G7A is a state-of-the-art wafer stepper designed for advanced photomask development and fabrication. The equipment provides superior photomask imaging quality, high throughput, and low cost of ownership. It is capable of delivering up to 175 mm scanning fields. The system offers a wide range of exposure variations with resolution down to 1.00 nm. It also provides maximum flexibility for the user to produce photomasks with accuracy and high throughput. NIKON NSR-1755G7A is equipped with a compact, single-column scanning stage and a high-precision optical unit that enables fast and precise alignment of the mask and wafer. It is equipped with a long-life illumination source composed of a xenon light and a precession movement optical machine which is able to hemi-sinusoidally scan the light. This ensures high-throughput and uniform illumination. The wafer stepper also features NIKON unique Scanning Laser Interferometer (SLI) technology for unprecedented accuracy and repeatability in a stepper tool. This high-precision optical asset measures positional displacement through interference of laser light, thereby providing a superior level of accuracy over various exposure environments. Furthermore, the model is compliant with the international lithography CAD (CLIP) standard, which facilitates interfacing with other components within NIKON NSR litho platform. It also supports a host of lithography process technologies such as Darkfield imaging, Contact Printing, Laser-Scan Mask Cutting, and Substrate Scanning. The advanced image processing capabilities of the equipment ensure high-precision detection, characterization, and reconstruction of lithographic defects and other critical features. In addition, NSR-1755 G7A also offers an operability-enhancing GUI for easy operation. It is equipped with a multi-language sequence editor (OPL) to support various process requirements. The system features multiple function options such as auto-false-alarm-detection, reticle-matching, improved alignment tolerance, and low-power pre-alignment. Overall, NSR 1755 G7A is an advanced wafer stepper, designed to meet the requirements of today's more demanding photomask development and fabrication processes. The unit's superior optical accuracy, high throughput, and low cost of operation make it an ideal solution for advanced lithography requirements.