Used NIKON NSR 1755 i7A #293655181 for sale

NIKON NSR 1755 i7A is a state-of-the-art wafer stepper designed for wafer processes across a wide range of applications. With a highly accurate step and scan, and high-speed operation, this stepper promises improved throughput, higher yields, decreased costs and overall higher productivity. The stepper has a dual-axis equipment, utilizing new scan and mirror systems to increase accuracy and speed. It also features an industry-leading moving stage option, allowing for acceleration that is up to 20% faster than other models, while maintaining beat-to-beat accuracy. The stepper also features a high-precision edge alignment function and wafer-level unloading that helps ensure consistent chip edge placement. Additionally, NIKON NSR 1755I7A uses image-based auto-operation measures that reduces the time to prepare a wafer to within just 7 minutes. NSR-1755I7A uses a 400nm optical system with a 5.2 Diagonal measurement, ensuring the highest accuracy and error margins for processes like photolithography. The photolithography unit allows for resist processing control and improved levels of optical resolution, allowing for a better dose accuracy and uniformity of film. It utilizes advanced optical design, a suite of process control tools, and built-in fast-CD processing to help achieve desired feature dimensions and accuracy. The lens systems also use NIKON Precision Optics, providing top-level image quality and numerical aperture accuracy. Furthermore, NSR-1755 I 7 A is designed for a variety of process sizes, ranging from 200 mm to 12 inches or larger. The wafer stepper is also fully automated and comes with an on-site preventive maintenance function, which allows for continued operation without interruption. Moreover, the stepper features a sensor-based machine that helps provide optimum exposure conditions. All in all, NSR 1755 i7A is an advanced wafer stepper that provides highly accurate step and scan, and high-speed operation. This stepper can help improve throughput, higher yields, decreased costs, and better productivity across a variety of wafer process applications.